/ 
Physics-Etch-0.01
/ Physics::Etch::Etchant

NAME

Physics::Etch::Etchant - the chemistry used by an etch process

SYNOPSIS

use Physics::Etch::Etchant;

my $fecl3 = Physics::Etch::Etchant->new(
    name        => 'FeCl3',
    type        => 'wet',
    composition => 'Ferric chloride, ~40 Baume',
    mechanism   => 'chemical',
);

my $sf6 = Physics::Etch::Etchant->new(
    name        => 'SF6/O2',
    type        => 'dry',
    composition => 'SF6 45 sccm / O2 5 sccm',
    mechanism   => 'ion-assisted',
);

DESCRIPTION

Describes an etchant. Wet etchants are liquid chemistries; dry etchants are plasma feed-gas mixtures. mechanism records whether removal is dominated by chemical reaction, physical sputtering, or synergistic ion-assisted etching.